P-TYPE DIFFUSION LAYER FORMATION COMPOSITION, P-TYPE DIFFUSION LAYER MANUFACTURING METHOD AND SOLAR CELL ELEMENT MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a p-type diffusion layer formation composition, a p-type diffusion layer manufacturing method and a solar cell element manufacturing method, which can inhibit reaction between a p-type diffusion layer formation composition and a substrate at a high temperature while inhibiting the occurrence of warpage of a silicon substrate at the time of a heat treatment to form a low-resistance p-type diffusion layer.SOLUTION: A p-type diffusion layer formation composition contains at least one boron compound selected from a boron nitride and a boron carbide, and a dispersion medium. A p-type diffusion layer and a solar cell element having a p-type diffusion layer are manufactured by coating a semiconductor substrate with the p-type diffusion layer formation composition and performing a heat diffusion treatment on the semiconductor substrate.