| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for sufficiently removing residues and fringes of a pattern remaining on a substrate in a washing step after development in color filter manufacture. <P>SOLUTION: In a developing apparatus used for color filter manufacture containing steps of: forming a photosensitive resin layer on the substrate, a step of pattern exposure; and removing an unnecessary portion by development, a substrate developing apparatus is provided with a washing unit uniformly spray-jetting behind a developing treatment tank. <P>COPYRIGHT: (C)2007,JPO&INPIT |
