| 摘要 |
A plasma processing apparatus and an electrode used therein are provided to generate a plasma having extremely high uniformity by decreasing non-uniformity of electric field distribution on an electrode surface in a large area from a center portion to an edge portion of the electrode. An electrode plate(310) is disposed to face a second electrode(300). A support(320) supports the electrode plate, in which the support contacts a surface of the electrode plate which is opposite to the second electrode. A dielectric portion is provided on a contact surface of the support with the electrode plate, and is formed in such a way that a center portion thereof has a height different from that of an edge portion thereof. The center portion of the dielectric portion is higher than that of the edge portion thereof.
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