| 摘要 |
A plasma-enhanced chemical vapor deposition chamber having a dual heat blocking fence is provided to prevent heat loss of a susceptor by installing a heat blocking fence between the susceptor and an inner wall of the chamber. A deposition chamber includes a lower body having a susceptor(13), on which a substrate is loaded, and an upper body positioned on the lower body. The upper body has a high-frequency electrode plate and a shower head. A heat blocking fence(25) is interposed between the susceptor and an inner wall of the chamber in the lower body of the chamber to block the heat radiated from the susceptor. A protective plate(15) is attached to the inner wall of the chamber to protect the inner wall when cleaning the chamber.
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