| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a preferred positive resist composition superior in etching resistance. <P>SOLUTION: The positive resist composition contains a resin component (A) which has a constitutional unit (a0) derived from an acrylic ester containing a non-acid-dissociable group having a carbon-carbon triple bond, and of which the solubility in an alkali developer increases by the action of an acid, and an acid generator component (B) which generates an acid upon exposure to light. The constitutional unit (a0) may be a constitutional unit (a0-1) represented by a (meth)acrylate containing a triple bond in a side chain. <P>COPYRIGHT: (C)2009,JPO&INPIT |
