| 摘要 |
PROBLEM TO BE SOLVED: To provide an art favorable to reduce the occurrence of a defective part while reducing a dark output.SOLUTION: A photoelectric conversion device manufacturing method comprises: a process of forming a conductor pattern on a semiconductor substrate having a photoelectric conversion part by an aluminum-containing material; a process of forming a hydrogen-containing insulation film on the conductor pattern; a process of performing a first heat treatment on a structure including the semiconductor substrate, the conductor pattern and the insulation film in a hydrogen-containing atmosphere; a process of forming a protection film having hydrogen permeability lower than that of the insulation film on the insulation film after the first heat treatment; and a process of performing a second heat treatment on a structure including the semiconductor substrate, the conductor pattern, the insulation film and the protection film in a hydrogen-containing atmosphere after formation of the protection film. A temperature of the first heat treatment is over a temperature when forming the insulation film and equal to or less than a temperature when forming the protection film.SELECTED DRAWING: Figure 3 |
