发明名称 WAFER ROTATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a wafer rotation device for improving the yield of a wafer.SOLUTION: A wafer rotation device 100 includes a base 110, a carrier device 120, a first shaft gear 130, a power supply unit, a roller, a second shaft gear 160, and a drive assembly 170. The base has a housing space in which a carrier device for housing the wafer 122 is disposed. The first shaft gear is arranged on a side surface of the base. The power supply unit is assembled to an upper part of the base and connected to the first shaft gear. The roller is located below the carrier device and supports an end of the wafer. The second shaft gear is arranged on the side surface of the base and connected to the roller. The drive assembly is connected between the first shaft gear and the second shaft gear. The power supply unit supplies electric power via the first shaft gear, the drive assembly, and the second shaft gear and drives the roller to rotate the wafer.SELECTED DRAWING: Figure 1
申请公布号 JP2016213450(A) 申请公布日期 2016.12.15
申请号 JP20160086440 申请日期 2016.04.22
申请人 GLOBALWAFERS CO LTD 发明人 CHANG YUAN-HAO;LEE TE-HAO;SHIH YING-RU;SEO MUN-GYONG
分类号 H01L21/683;H01L21/304 主分类号 H01L21/683
代理机构 代理人
主权项
地址