| 发明名称 |
Method and System for Imaging of a Photomask Through a Pellicle |
| 摘要 |
A system for imaging a sample through a protective pellicle is disclosed. The system includes an electron beam source configured to generate an electron beam and a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample. The system also includes an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample. In addition, the system includes a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample. |
| 申请公布号 |
US2016225582(A1) |
申请公布日期 |
2016.08.04 |
| 申请号 |
US201615012599 |
申请日期 |
2016.02.01 |
| 申请人 |
KLA-Tencor Corporation |
发明人 |
Schultz William G.;Delgado Gildardo;Rose Garry A. |
| 分类号 |
H01J37/28;H01J37/147;H01J37/26 |
主分类号 |
H01J37/28 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A scanning electron microscopy apparatus comprising:
an electron beam source configured to generate an electron beam; a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample; an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample; and a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample. |
| 地址 |
Milpitas CA US |
