发明名称 |
POLISHING COMPOSITION AND PRODUCTION METHOD THEREFOR |
摘要 |
Provided is a polishing composition with which haze and surface defects can be reduced. This invention provides a polishing composition comprising a synthetic water-soluble polymer M L-end that has a hydrophobic region at least at one end of its main chain. The hydrophobic region has at least one hydrophobic group derived from a polymerization initiator. |
申请公布号 |
EP3053978(A1) |
申请公布日期 |
2016.08.10 |
申请号 |
EP20140848277 |
申请日期 |
2014.09.22 |
申请人 |
FUJIMI INCORPORATED |
发明人 |
TSUCHIYA, KOHSUKE;MORI, YOSHIO |
分类号 |
C09K3/14;B24B37/00;C09G1/04;H01L21/304 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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