| 发明名称 |
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS |
| 摘要 |
An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target. |
| 申请公布号 |
US2016255709(A1) |
申请公布日期 |
2016.09.01 |
| 申请号 |
US201615152124 |
申请日期 |
2016.05.11 |
| 申请人 |
Gigaphoton Inc. |
发明人 |
IWAMOTO Fumio;NAKANO Masaki;HORI Tsukasa |
| 分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An extreme ultraviolet light generation apparatus comprising:
a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target. |
| 地址 |
Tochigi-ken JP |
