发明名称 CRYSTALLIZATION METHOD OF SILICON
摘要 PROBLEM TO BE SOLVED: To provide a crystallization method of silicon for manufacturing polysilicon with excellent crystal characteristics. SOLUTION: The crystallization method of the silicon includes: (a) a step of disposing a metal catalyst on amorphous silicon; (b) a step of performing thermal treatment at a first thermal treatment temperature so as to crystallize the amorphous silicon on which the metal catalyst is disposed; and (c) a step of performing the thermal treatment at a second thermal treatment temperature higher than the first thermal treatment temperature so as to remove crystal defects inside silicon crystal grains generated in the step (b). COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009135488(A) 申请公布日期 2009.06.18
申请号 JP20080287914 申请日期 2008.11.10
申请人 TERA SEMICON CORP 发明人 JANG TAEK-YONG;BYUNG-IL LEE;JANG SEOK PIL
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
主权项
地址