| 摘要 |
An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical raster element (72) configured to produce a plurality of secondary light sources (95) located in a system pupil surface (70). The optical raster element (72) has a plurality of light entrance facets (92) each being associated with one of the secondary light sources (95). A beam deflecting device comprises a beam deflection array (46) of reflective or transparent beam deflecting elements (M ij ) each being configured to illuminate a spot (90) on one of the light entrance facets (92) at a position that is variable by changing a deflection angle produced by the beam deflecting element (M ij ). A control unit (50) is configured to control the beam deflection elements (M ij ) such that variable light patterns (LP) assembled from the spots (80) can be formed on at least one of the plurality of light entrance facets (92). |
