发明名称 AMPLITUDE MASK FOR WRITING LONG-PERIOD GRATINGS
摘要 <p>Long-period gratings are written more quickly and at higher intensities by amplitude masks having shadow-forming patterns that scatter, redirect, or otherwise divert shadow portions of radiation used for writing the gratings instead of blocking the shadow portions by absorption or reflection. The shadow-forming masks can be formed along transparent base optics by arrays of diffusers, diffractors, or refractors that relatively divert different portions of the radiation.</p>
申请公布号 WO2001088611(A1) 申请公布日期 2001.11.22
申请号 US2001009954 申请日期 2001.03.28
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