发明名称 |
Chemical Circulation System and Methods of Cleaning Chemicals |
摘要 |
A method includes passing a chemical solution through a metal-ion absorber, wherein metal ions in the metal-ion absorber are trapped by the metal-ion absorber. The chemical solution exiting out of the metal-ion absorber is then used to etch a metal-containing region, wherein the metal-containing region includes a metal that is of a same element type as the metal ions. |
申请公布号 |
US2016254166(A1) |
申请公布日期 |
2016.09.01 |
申请号 |
US201615149502 |
申请日期 |
2016.05.09 |
申请人 |
Taiwan Semiconductor Manufacturing Co. Ltd. |
发明人 |
Huang Chien-Hua;Lee Chung-Ju |
分类号 |
H01L21/3213;H01L21/66;H01L21/02;H01L21/67 |
主分类号 |
H01L21/3213 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method comprising:
using a wet-clean circulation system to form an integrated circuit, the wet-clean circulation system comprising:
a storage;a filter connected to the storage;a metal ion absorber connected to the filter; anda monitor connected to the metal ion absorber; and a process chamber, wherein the storage, the filter, the metal ion absorber, the monitor, and the process chamber are connected in series to allow a chemical solution to circulate in the wet-clean circulation system. |
地址 |
Hsin-Chu TW |