发明名称 Chemical Circulation System and Methods of Cleaning Chemicals
摘要 A method includes passing a chemical solution through a metal-ion absorber, wherein metal ions in the metal-ion absorber are trapped by the metal-ion absorber. The chemical solution exiting out of the metal-ion absorber is then used to etch a metal-containing region, wherein the metal-containing region includes a metal that is of a same element type as the metal ions.
申请公布号 US2016254166(A1) 申请公布日期 2016.09.01
申请号 US201615149502 申请日期 2016.05.09
申请人 Taiwan Semiconductor Manufacturing Co. Ltd. 发明人 Huang Chien-Hua;Lee Chung-Ju
分类号 H01L21/3213;H01L21/66;H01L21/02;H01L21/67 主分类号 H01L21/3213
代理机构 代理人
主权项 1. A method comprising: using a wet-clean circulation system to form an integrated circuit, the wet-clean circulation system comprising: a storage;a filter connected to the storage;a metal ion absorber connected to the filter; anda monitor connected to the metal ion absorber; and a process chamber, wherein the storage, the filter, the metal ion absorber, the monitor, and the process chamber are connected in series to allow a chemical solution to circulate in the wet-clean circulation system.
地址 Hsin-Chu TW