发明名称 THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME
摘要 A thin film transistor array panel includes a gate line disposed on a substrate, the gate line including a gate electrode, a gate insulating layer disposed on the gate electrode, a semiconductor layer disposed on the substrate, the semiconductor layer including an oxide semiconductor, a data line disposed on the substrate and crossing the gate line, a data line layer including a source electrode connected to the data line and a drain electrode facing the source electrode, and a passivation layer covering the source electrode and the drain electrode. The data line layer includes copper or a copper alloy, and the semiconductor layer includes a copper doped oxide semiconductor. A content of copper doped on the oxide semiconductor is 0.2% to 0.82%.
申请公布号 US2016300950(A1) 申请公布日期 2016.10.13
申请号 US201514887483 申请日期 2015.10.20
申请人 Samsung Display Co., Ltd. 发明人 LEE Hyeon Jun;Kim Ki Won;Kim Yoo Ho;Kim Joon Geol;Lee Doo Hyoung
分类号 H01L29/786;H01L29/423;H01L29/45;H01L21/4763;H01L29/22;H01L29/66;H01L21/44;H01L27/12;H01L29/24 主分类号 H01L29/786
代理机构 代理人
主权项 1. A thin film transistor array panel, comprising: a gate line disposed on a substrate, the gate line comprising a gate electrode; a gate insulating layer disposed on the gate electrode; a semiconductor layer disposed on the substrate, the semiconductor layer comprising an oxide semiconductor; a data line disposed on the substrate and crossing the gate line; a data line layer comprising a source electrode connected to the data line and a drain electrode facing the source electrode; and a passivation layer covering the source electrode and the drain electrode, wherein the data line layer comprises copper or a copper alloy, and the semiconductor layer comprises a copper doped oxide semiconductor, and a content of copper doped on the oxide semiconductor is 0.2% to 0.82%.
地址 Yongin-si KR