| 摘要 |
Provided are: a zinc oxide-based transparent oxide film which has a low refractive index and good gas barrier properties; and a process for producing the same. This transparent oxide film is amorphous, and has a composition which contains, relative to the total amount of all the metal components, 0.9 to 20.0at% of Al and 25.5 to 68.0at% of Si with the balance consisting of Zn and unavoidable impurities. In this process, DC sputtering is conducted in an inert gas atmosphere that contains oxygen and/or under such conditions that the substrate is in a heated state, using a sputtering target consisting of a sintered oxide which has a composition that contains, relative to the total amount of all the metal components, 0.3 to 4.0wt% of Al and 6.0 to 14.5wt% of Si with the balance consisting of Zn and unavoidable impurities and in which both a composite oxide, Zn2SiO4, and ZnO are present in the structure. |
