| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus for plasma-processing a substrate, which is suitable for an experiment, a development work and a low production, while reducing troubles about transportation of the substrate in the plasma processing apparatus. SOLUTION: The plasma processing apparatus comprises a processing chamber; a preliminary chamber which is arranged in a tilting direction to a center axis of the processing chamber and is made to communicate with the processing chamber so as to be interruptable; a substrate electrode part having a substrate-mounting face capable of mounting the substrate on the top surface; a substrate electrode-moving unit for moving the substrate electrode part between a plasma-processing position in the processing chamber and a substrate-transferring position in the preliminary chamber, while keeping the substrate-mounting face generally horizontal; and a lid part provided in the preliminary chamber so as to be openable. Furthermore, the substrate electrode-moving unit of the plasma processing apparatus can move the substrate electrode part along the tilted direction between the plasma-processing position and the substrate-transferring position. COPYRIGHT: (C)2005,JPO&NCIPI
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