リソグラフィ装置およびリソグラフィ方法

摘要

A lithographic apparatus includes a radiation source configured to produce a radiation beam. The lithographic apparatus also includes a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. The support is provided with a pellicle which comprises a layer of graphene.