| 发明名称 |
ION IMPLANTATION FOR SUPERCONDUCTOR TAPE FABRICATION |
| 摘要 |
A method of forming a superconductor tape, includes depositing a superconductor layer on a substrate, forming a metal layer comprising a first metal on a surface of the superconductor layer, and implanting an alloy species into the metal layer where the first metal forms a metal alloy after the implanting the alloy species. |
| 申请公布号 |
US2016160344(A1) |
申请公布日期 |
2016.06.09 |
| 申请号 |
US201314091510 |
申请日期 |
2013.11.27 |
| 申请人 |
Varian Semiconductor Equipment Associates, Inc. |
发明人 |
Wang Connie P.;Murphy Paul;Sullivan Paul;Godet Ludovic;Sinclair Frank;Evans Morgan |
| 分类号 |
C23C14/48;C23C14/58;C23C14/02;H01B13/00;H01B12/02 |
主分类号 |
C23C14/48 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of forming a superconductor tape, comprising:
depositing a superconductor layer on a substrate; forming a metal layer comprising a first metal on a surface of the superconductor layer; and implanting an alloy species into the metal layer, wherein the first metal forms a metal alloy after the implanting of the alloy species. |
| 地址 |
Gloucester MA US |
