| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device capable of suppressing the distribution of an exhaust speed according to a plasma processing condition.SOLUTION: A plasma processing apparatus includes a processing container capable of maintaining an environment which is reduced in pressure to be lower than the atmospheric pressure, a pressure reducing part for reducing the interior of the processing container to a predetermined pressure, a mounting part which is provided in the processing container to mount a processing target thereon, a gas supply part for supplying process gas into the processing container, a plasma generator for generating plasma in the processing container, and a rectifying plate that is provided freely detachably to the mounting part. The rectifying plate has a hole portion in which the mounting part is located when the rectifying plate is provided to the mounting part. The center of the rectifying plate and the center of the hole portion are separate from each other.SELECTED DRAWING: Figure 1 |
