| 摘要 |
PROBLEM TO BE SOLVED: To provide cleaning liquid which is excellent in removing properties of stains and safety and is for use in removal of stains from a fine uneven structure having a period equal to or shorter than the wavelength of visible light.SOLUTION: In a first embodiment, the cleaning liquid is provided which is for use in cleaning of a fine uneven structure 10 composed of: fine uneven structure composed of an active energy ray-curable resin composition; and a transparent base material supporting the fine uneven structure, and in which the cleaning liquid is a weak basic aqueous solution. In a second embodiment, the cleaning liquid is provided which is identical to the cleaning liquid in the first embodiment except that a pH of the aqueous solution is 8 to 10.SELECTED DRAWING: Figure 1 |
