| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lighting system and an exposure apparatus capable of carrying out exposure with excellent quality and improving a working speed even when the Hx/Hy of the lateral dimension Hx to the vertical dimension Hy of an optical modulation plane of a two-dimensional spatial modulator is controlled to 1.5 or larger (wherein the vertical direction matches the moving direction of a substrate to be exposed). <P>SOLUTION: The focal length fx in the x-direction and the focal length fy in the y-direction of a second optical system 15 that guides exiting light from an integrator 13 to a two-dimensional spatial modulator 21 are controlled to be different from each other, for example, satisfying fx/fy=1.6. By this method, the aspect ratio dx:dy of a rod lens 131 can be controlled to 1.6:1 which is nearer to 1, the number of rods in the integrator 13 can be the same in the lateral and vertical directions, and the ratio Hx/Hy can be controlled to 2.5. In a practical use, the aspect ratio Hx/Hy of an irradiation region of the two-dimensional spatial modulator can be increased to 3.5 or more. <P>COPYRIGHT: (C)2008,JPO&INPIT |
