| 发明名称 |
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM |
| 摘要 |
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described. |
| 申请公布号 |
US2016176840(A1) |
申请公布日期 |
2016.06.23 |
| 申请号 |
US201615005177 |
申请日期 |
2016.01.25 |
| 申请人 |
Mitsubishi Gas Chemical Company, Inc. |
发明人 |
ECHIGO Masatoshi;YAMAKAWA Masako |
| 分类号 |
C07D311/78;C07C39/14;G03F7/004 |
主分类号 |
C07D311/78 |
| 代理机构 |
|
代理人 |
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| 主权项 |
|
| 地址 |
Tokyo JP |
