SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

摘要

Provided are a semiconductor device, and a method of fabricating the same. The semiconductor device comprises: a second semiconductor pattern arranged on a substrate, providing a channel region; a first semiconductor pattern arranged between the substrate and the second semiconductor pattern, providing a part touching the second semiconductor pattern to the channel region; and parts exposed by the second semiconductor pattern to the source/drain regions. As such, processing costs of the semiconductor is able to be reduced, and the stability of the semiconductor device being able to be improved.