| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus which can supply and recover liquid in a desired state, and suppress deterioration of a pattern image projected on a substrate.SOLUTION: An exposure apparatus comprises: a nozzle member (70) having a supply opening (12) for supplying liquid (LQ) and a recovery opening (22) for recovering the liquid (LQ); and an anti-vibration mechanism (60) for performing anti-vibration support of a nozzle member (70) against a lower step portion (7) of a main column (1). |
