发明名称 SURFACE RELIEF MICROSTRUCTURE, RELATED DEVICES, AND METHOD OF MAKING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for replicating a patterned surface relief microstructure.SOLUTION: A method for replicating a patterned surface relief microstructure includes steps of; generating a first layer with a patterned surface relief microstructure; and generating a master by copying the microstructure of the first layer into a second layer, thereby involving at least one dry or wet etching step, and an additional step in which the microstructure of the master is brought into contact with a replica material such that the microstructure of the master is reproduced in the replica.
申请公布号 JP2015092268(A) 申请公布日期 2015.05.14
申请号 JP20140266440 申请日期 2014.12.26
申请人 ROLIC AG 发明人 MOHAMMED IBN-ELHAJ;JULIEN MARTZ;HUBERT SEIBERLE;WOLFGANG WERNET
分类号 G02B5/18;B42D25/324;B42D25/425 主分类号 G02B5/18
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