发明名称 |
Pattern defect inspection method and apparatus using image correction technique |
摘要 |
An image correction method employable in a pattern inspection method for emitting light falling onto a workpiece with a pattern formed thereon and for inspecting a pattern image resulting from the pickup of an optical image of the workpiece by comparing it to a corresponding fiducial pattern image is disclosed. The method includes the step of generating a system of equations describing therein an input/output relation using a 2D linear prediction model(s) with respect to the pattern image being tested and the fiducial pattern image. Then, estimate the equation system by least-squares methods to thereby obtain a parameter of the equation system. Next obtain a centroid of the parameter. Then perform interpolation using the value of the centroid, thereby to generate a corrected image. A pattern defect inspection method using the image correction method is also disclosed.
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申请公布号 |
US2006222233(A1) |
申请公布日期 |
2006.10.05 |
申请号 |
US20060386744 |
申请日期 |
2006.03.23 |
申请人 |
ADVANCED MASK INSPECTION TECHNOLOGY INC. |
发明人 |
SUGIHARA SHINJI;OAKI JUNJI |
分类号 |
G06K9/00;G01B11/30;G01N21/956;G03F1/72;G03F1/84;G06T1/00;G06T7/60;H01L21/027 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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