发明名称 ELECTROSTATIC CHUCK FOR VACUUM LAMINATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To achieve stable attraction holding while preventing breakage of an electrostatic attraction function section due to biting of a foreign matter. SOLUTION: An electrostatic chuck for a vacuum lamination apparatus is provided with an electrode 1a having two or more poles and a dielectric layer 1b for covering the electrode, and is used for allowing the dielectric layer to contact a glass substrate B in a vacuum to attraction-hold the glass substrate B. In the electrostatic chuck, the thickness T of the dielectric layer is set at 50-200μm. Further, the electrode has a two-pole interdigital structure and the width L of the interdigital electrodes is set at 0.5-1.5 mm, or the interval S between the interdigital electrodes is set at 0.5-1.5 mm. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008027927(A) 申请公布日期 2008.02.07
申请号 JP20040316174 申请日期 2004.10.29
申请人 SHIN-ETSU ENGINEERING CO LTD;TOMOEGAWA PAPER CO LTD 发明人 OTANI YOSHIKAZU;SHIMA TAKESHI
分类号 H01L21/683;G02F1/13;G09F9/00 主分类号 H01L21/683
代理机构 代理人
主权项
地址