| 摘要 |
<P>PROBLEM TO BE SOLVED: To have the excellent shape accuracy (uniformity of unnecessary film removing width) of a resist film edge portion after removing an unnecessary film by suppressing looseness between a substrate and a substrate holding means, and further looseness between a substrate and a covering member. <P>SOLUTION: The maskblank manufacturing method includes; a process for rotatively coating a resist film on a maskblank surface in a state in which the maskblank is fixed on a rotation holding means held so as to plane-rotate the maskblank to be mechanically pressed so that the center of the maskblank is matched to the rotating center of the rotation holding means; and a process for forming a fixed interval with the main surface of the maskblank in the removed area of the main surface of the maskblank, and supplying chemicals into the clearance while rotating the substrate holding means in a state where the covering member covering the main surface of the maskblank is positioned so as to be matched with the rotation center and fixed on the substrate holding means so that a space larger than the interval is formed in a non-removed area of the main surface of the maskblank. <P>COPYRIGHT: (C)2008,JPO&INPIT |
