发明名称 MICROWAVE PROCESSING APPARATUS FOR SELECTIVE HEATING OF MICRO-STRUCTURED CONDUCTIVE PATTERNS
摘要 Disclosed is a microwave processing apparatus for heat-treating a structure with a micro- or nano-sized conductive pattern. The microwave processing apparatus according to the present invention includes a microwave oven for heat-treating a sample to be heated; a magnetron for outputting a microwave to the microwave oven; a pulse power supply for applying a pulse voltage to the magnetron; and a microwave oven controller for controlling the pulse power supply, wherein the microwave oven controller controls such that a microwave having a pulse width of 100 ms or less is applied to the microwave oven. According to the present invention, a microwave processing apparatus which is capable of selectively heating a conductive pattern without damaging a periphery material or a matrix may be provided.
申请公布号 KR20160069009(A) 申请公布日期 2016.06.16
申请号 KR20140173643 申请日期 2014.12.05
申请人 KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE 发明人 KIM, DAE HO;SEOI, SEUNG KWON;CHANG, WON SUK
分类号 H05B6/64;F24C7/02 主分类号 H05B6/64
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