发明名称 MANUFACTURING METHOD OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate capable of improving a yield, by reducing the defective ratio in processing of using existing equipment, without using a large-scale device and a highly accurate surface plate, by restraining a defect of a substrate surface causable as a killer defect, in processing of the substrate, particularly, a synthetic quartz glass substrate.SOLUTION: A manufacturing method of a substrate includes a process of polishing-processing the substrate, by holding the substrate 6 in a work hole 7 formed in a carrier 5 provided on a lower surface plate 3, and landing an upper surface plate 2 on a substrate surface while rotating the lower surface plate in a state of coating a shock absorbing liquid on the substrate surface, and then, rotating the upper-lower surface plates while accompanying polishing slurry on the substrate surface.SELECTED DRAWING: Figure 1
申请公布号 JP2016209987(A) 申请公布日期 2016.12.15
申请号 JP20150114759 申请日期 2015.06.05
申请人 SHIN ETSU CHEM CO LTD 发明人 MATSUI HARUNOBU;HARADA HIROMI;TAKEUCHI MASAKI
分类号 B24B37/08;B24B37/00;C03C19/00;H01L21/304 主分类号 B24B37/08
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