INDUCTIVELY-COUPLED MULTI-COIL PLASMA SOURCE FOR PROVIDING UNIFORM PLASMA, IN WHICH COIL IS ARRAY TO GENERATE PLASMA SPECIALLY

摘要

PURPOSE: An inductively-coupled multi-coil plasma source for providing uniform plasma is provided to maximize uniformity of magnetic field by maximizing the intensity of inductive magnetic field within a limited area. CONSTITUTION: An inductively-coupled multi-coil plasma source includes a first inductive coil, a plurality of second inductive coils, and a power supply. The second inductive coils(250) are arranged around the outside of the first inductive coil(210). The second inductive coils facing the first inductive coil are parallel to the first inductive coil. The power supply(410) is used for supplying the power to the first inductive coil and the second inductive coils in order to provide the inductive magnetic field enabling the first inductive coil and the second inductive coils to generate plasma.