发明名称 Fabricating process of an electrically conductive structure on a circuit board
摘要 The fabricating process of an electrically conductive structure on a circuit board includes: providing a circuit board with a plurality of electrically connecting pads formed thereon; forming a first insulating layer on the circuit board, the first insulating layer covering the electrically connecting pads; forming a conductive layer on the first insulating layer; forming a second insulating layer on the conductive layer; applying an opening process to the first insulating layer, the conductive layer and the second insulating layer directly over the electrically connecting pads to form openings through the three layers corresponding in position to the electrically connecting pads; and forming bumps in the opening by electroplating. The fabricating process of the present invention can reduce the number of alignment steps and fabricating cost.
申请公布号 US2006223299(A1) 申请公布日期 2006.10.05
申请号 US20050295003 申请日期 2005.12.05
申请人 HU WEN-HENG 发明人 HU WEN-HENG
分类号 H01L21/44 主分类号 H01L21/44
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