发明名称 ASH-FREE CYCLIC ORGANIC POLYOL-BASED REACTIVE POROGENS AND NANOPOROUS ULTRA LOW DIELECTRIC FILM BY USING THE SAME
摘要 The present disclosure relates to a reactive porogen using cyclic organic polyol and an ultra low dielectric film prepared using the same, and more particularly, to novel cyclic organic polyol as a cyclic organic polyol compound which can be completely pyrolyzed at a temperature of 500° C. or less, does not leave carbon residue during a heat treatment if an end hydroxyl group of the cyclic organic compound is substituted by a functional group of alkylalkoxysilane and then used as a reactive porogen, and is involved in a sol-gel reaction of organic silicate and suppresses phase separation and thus forms pores having a uniform size and has excellent mechanical properties as compared with a porosity, a reactive porogen using the ash-free cyclic organic polyol, and an ultra low dielectric film prepared using the same.
申请公布号 US2016251381(A1) 申请公布日期 2016.09.01
申请号 US201615054608 申请日期 2016.02.26
申请人 Sogang University Research Foundation 发明人 Rhee Hee-Woo;Cho Sung-Min
分类号 C07F7/18;H01L21/02;H01L23/532;C08J9/14 主分类号 C07F7/18
代理机构 代理人
主权项 1. A cyclic organic polyol compound including a central carbocycle, in which a hydrogen atom of a hydroxyl group in the central carbocycle is substituted by an alkoxysilylalkylene group.
地址 Seoul KR