发明名称 |
ASH-FREE CYCLIC ORGANIC POLYOL-BASED REACTIVE POROGENS AND NANOPOROUS ULTRA LOW DIELECTRIC FILM BY USING THE SAME |
摘要 |
The present disclosure relates to a reactive porogen using cyclic organic polyol and an ultra low dielectric film prepared using the same, and more particularly, to novel cyclic organic polyol as a cyclic organic polyol compound which can be completely pyrolyzed at a temperature of 500° C. or less, does not leave carbon residue during a heat treatment if an end hydroxyl group of the cyclic organic compound is substituted by a functional group of alkylalkoxysilane and then used as a reactive porogen, and is involved in a sol-gel reaction of organic silicate and suppresses phase separation and thus forms pores having a uniform size and has excellent mechanical properties as compared with a porosity, a reactive porogen using the ash-free cyclic organic polyol, and an ultra low dielectric film prepared using the same. |
申请公布号 |
US2016251381(A1) |
申请公布日期 |
2016.09.01 |
申请号 |
US201615054608 |
申请日期 |
2016.02.26 |
申请人 |
Sogang University Research Foundation |
发明人 |
Rhee Hee-Woo;Cho Sung-Min |
分类号 |
C07F7/18;H01L21/02;H01L23/532;C08J9/14 |
主分类号 |
C07F7/18 |
代理机构 |
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代理人 |
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主权项 |
1. A cyclic organic polyol compound including a central carbocycle, in which a hydrogen atom of a hydroxyl group in the central carbocycle is substituted by an alkoxysilylalkylene group. |
地址 |
Seoul KR |