| 发明名称 |
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition capable of forming a film excellent in cracking resistance. <P>SOLUTION: The chemically amplified positive resist composition comprises (A) a resin obtained by reacting a poly(hydroxystyrene) polymer in which part of hydrogens of phenolic hydroxyl groups have been substituted for acetal type residues and a novolac polymer with a compound containing at least two vinyl ether groups per molecule and (B) an acid generator. In the composition, the poly(hydroxystyrene) polymer may be a polymer having a structural unit represented by formula (I) and a structural unit represented by formula (Ib). <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2008046594(A) |
申请公布日期 |
2008.02.28 |
| 申请号 |
JP20070068047 |
申请日期 |
2007.03.16 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
SUETSUGU MASUMI;HASHIMOTO KAZUHIKO;TOISHI KOJI |
| 分类号 |
G03F7/039;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
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