| 摘要 |
The present invention relates to an N2 purge nozzle of a load port module (LPM), capable of supplying N2 to a front opening unified pod (FOUP) of a semiconductor wafer processing device. The N2 purge nozzle with a leak preventing function includes: a nozzle pad combined with the top of the nozzle; and a rubber pad combined with the upper part of the nozzle pad, and preventing a leak by expanding a diaphragm with pressure of N2 purge. According to the present invention, when the FOUP is placed in the LPM, a spring of the nozzle is contracted while the FOUP is placed in the LPM without a level change to supply N2 to various kinds of FOUPs without a leak and a nozzle change. When N2 is purged, the nozzle is transformed to be suitable for an N2 inlet of the FOUP through the diaphragm to keep airtightness. |
