| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition which can easily exhibit both an effect for enhancing the polishing speed and an effect for enhancing the wettability of a polished surface, and to provide a manufacturing method for a substrate.SOLUTION: A polishing composition contains a water-soluble polymer having a weight-average molecular weight of 1000000 or less, and a molecular weight distribution of 5.0-8.0 represented by weight-average molecular weight (Mw)/number-average molecular weight (Mn). Preferably, the polishing composition further contains at least one kind of salt selected from organic salts and inorganic salts. A manufacturing method of a substrate includes a polishing step for polishing a substrate by using a polishing composition containing a water-soluble polymer having a weight-average molecular weight of 1000000 or less, and a molecular weight distribution of 5.0-8.0 represented by weight-average molecular weight (Mw)/number-average molecular weight (Mn). |
