发明名称 |
PRECURSOR FILM AND METHOD OF FORMING THE SAME |
摘要 |
A precursor film having a required gallium component proportion is formed easily at low cost. A precursor film for use in forming the light absorption layer of a CIS type thin-film solar cell, etc., or a method for forming the film are provided. A Cu-Ga layer having a high gallium component proportion (Ga/ (Ga+Cu)) of X% by weight Ga is formed as a first layer by sputtering using a precursor film comprising a Cu-Ga alloy layer having the gallium component proportion of X% by weight Ga as a target (deposition step A). Thereafter, a copper layer is formed as a second layer on the first layer by sputtering using a copper layer as a target (deposition step B) to thereby form a precursor film having the required gallium component proportion of Y% (X>Y) by weight Ga as the sum of the first layer and second layer. A method of film formation by simultaneous vapor deposition is also possible.
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申请公布号 |
EP1845563(A1) |
申请公布日期 |
2007.10.17 |
申请号 |
EP20050822368 |
申请日期 |
2005.12.27 |
申请人 |
SHOWA SHELL SEKIYU KABUSHIKI KAISHA |
发明人 |
KURIYAGAWA, SATORU;TANAKA, YOSHIAKI;NAGOYA, YOSHINORI |
分类号 |
H01L21/36;H01L21/02;H01L21/363;H01L31/032;H01L31/18 |
主分类号 |
H01L21/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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