| 摘要 |
<p>A gas discharge member is provided to prevent the corrosion of a chamber due to plasma cleaning gas by forming a sprayed film made of Al2O3 and Y2O3 on an inner wall of the chamber. A ring shaped head unit(30) is arranged in a process container. At least one ring-shaped gas channel is installed in the head unit. A gas introducing hole introduces the gas into the gas channel. Gas discharge holes(30a,30b,30c) are installed along an inner walls of the head unit. The gas discharge holes are communicated with the gas channel. The gas discharge holes discharge the gas into the process container. First, second, and third ring-shaped members are laminated on the head unit. The head unit has first and second ring-shaped channels. The gas introducing hole has first and second gas introducing holes. The gas discharge hole has first and second gas discharge holes. The first ring-shaped channel is communicated with the first gas introducing hole and the first gas discharge hole. The second ring-shaped channel is communicated with the second gas introducing hole and the second gas discharge hole.</p> |
