发明名称 SUPER-THIN CHANNEL TRANSISTOR STRUCTURE, FABRICATION, AND APPLICATIONS
摘要 Taught herein are transistor devices that utilize super-thin channels supported by dielectric bodies embedded in a semiconductor substrate. The super-thin channel is not subjected to a high-temp anneal process, and thus is not high doped. Rather, the source and drain form Schottky junctions with the channel. The lack of a high-temp anneal enables the transistors to be built on top of one another in a tiered structure without melting the lower tiers during fabrication. The ability to fabricate transistors in a tiered structure makes available a number of novel devices and architectuires.
申请公布号 WO2016179113(A1) 申请公布日期 2016.11.10
申请号 WO2016US30461 申请日期 2016.05.02
申请人 FINSCALE INC. 发明人 PIROGOVA, Rimma;KOLDIAEV, Viktor
分类号 H01L21/84;H01L21/8232;H01L21/8238;H01L27/24 主分类号 H01L21/84
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