发明名称 |
SUPER-THIN CHANNEL TRANSISTOR STRUCTURE, FABRICATION, AND APPLICATIONS |
摘要 |
Taught herein are transistor devices that utilize super-thin channels supported by dielectric bodies embedded in a semiconductor substrate. The super-thin channel is not subjected to a high-temp anneal process, and thus is not high doped. Rather, the source and drain form Schottky junctions with the channel. The lack of a high-temp anneal enables the transistors to be built on top of one another in a tiered structure without melting the lower tiers during fabrication. The ability to fabricate transistors in a tiered structure makes available a number of novel devices and architectuires. |
申请公布号 |
WO2016179113(A1) |
申请公布日期 |
2016.11.10 |
申请号 |
WO2016US30461 |
申请日期 |
2016.05.02 |
申请人 |
FINSCALE INC. |
发明人 |
PIROGOVA, Rimma;KOLDIAEV, Viktor |
分类号 |
H01L21/84;H01L21/8232;H01L21/8238;H01L27/24 |
主分类号 |
H01L21/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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