| 主权项 |
1. A method of processing a wafer which is formed on a front side thereof with a plurality of division lines in a crossing pattern and in which a plurality of devices are formed in a plurality of regions partitioned by the division lines, the method comprising:
a water-soluble resin coating step of coating the front side of the wafer with a water-soluble liquid resin to form a thin film; a protective plate fixing step of fixing the wafer to a protective plate for protecting the front side of the wafer, with a bond material interposed between the protective plate and the thin film; a back side grinding step of holding by a chuck table the protective plate with the wafer fixed thereto and grinding a back side of the wafer to make the wafer have a predetermined thickness; a protective plate releasing step of releasing the bond material together with the protective plate to which the wafer has been fixed, after the back side grinding step is conducted; and a bond material removing step of supplying water to the bond material remaining on the front side of the wafer having been subjected to the protective plate releasing step, to remove the thin film together with the bond material. |
