| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas processing device capable of uniformly supplying gases from each division shower head without using a needle valve and a flow meter even when the areas of division shower heads differ.SOLUTION: A gas processing device comprises a processing chamber, a shower head, a process gas supply unit, and a piping system. The shower head is a multi-division shower head divided into a plurality of division power heads. The piping system includes a plurality of pipes which individually supply a process gas from the process gas supply unit to the plurality of division shower heads. The division shower head comprises a base member 211, a shower plate 212 provided in the base member via a gas diffusion space and including many gas discharge holes 212a, and a baffle plate 213 provided in the gas diffusion space, including many discharge holes 213a, and having smaller conductance than the shower plate 212.SELECTED DRAWING: Figure 5 |
