| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus having a magnetic field lens with small spherical aberration, and to provide a process for fabricating high integration semiconductor devices with accurate pattern precisions. SOLUTION: The charged particle beam apparatus has a second magnetic field lens 602b arranged under a first magnetic field lens 602a in the direction of the optical axis. An opening 102b on the lower end side of a first magnetic pole 102 has a bore diameter D1L larger than the bore diameter D1U of an opening 102a on the upper end side of the first magnetic pole 102, the bore diameter D2U of an opening 103a on the upper end side of the second magnetic pole 103, and the bore diameter D2L of an opening 103b on the lower end side of the second magnetic pole 103. A process for fabricating a device by the charged particle beam apparatus is also provided. COPYRIGHT: (C)2008,JPO&INPIT
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