LAMINATE AND METHOD OF MANUFACTURING SAME, AND GAS BARRIER FILM AND METHOD OF MANUFACTURING SAME

摘要

The present invention provides a laminate and a method of manufacturing the same, and a gas barrier film and a method of manufacturing the same, the laminate and the film being capable of improving the barrier properties of an atomic layer deposition film, even if a substrate comprising a polymer is used. Provided are: a substrate (11) comprising a polymer material; an undercoating layer (12) that comprises an inorganic material including elemental tantalum, and that is disposed on at least a portion of a surface (11a) of the substrate (11); and an atomic layer deposition film (13) disposed so as to cover a surface (12a) of the undercoating layer (12).