PRE-LAYER DEFECT SITE REVIEW USING DESIGN

摘要

A system and method to image a layer of a wafer based on a coordinate of a defect in a pre-layer of the wafer are disclosed. A design file for the current layer can be aligned to the wafer using an image of the current layer. A design file for a previous layer can be aligned to the design file for the current layer.

主权项

1. A system comprising:
a defect review tool, wherein the defect review tool includes:
a stage configured to clamp a wafer; andan image generation system configured to generate an image of a layer of a surface of the wafer; and a controller configured to communicate with the defect review tool, wherein the controller is configured to:
align a design file for a current layer of the wafer to an image of the current layer;align a design file for a previous layer of the wafer to the design file for the current layer, wherein the previous layer is formed prior to the current layer; andidentify a region of the image of the current layer based on a coordinate of a defect in the previous layer, wherein the region corresponds to the coordinate of the defect in the previous layer.