METHOD FOR FORMING NANOSTRUCTURE

摘要

Provided is a method of forming a nanostructure using surface plasmon resonance (SPR). The method includes forming a photo-resist layer on a substrate, forming nanostructure materials on the photo-resist layer, photo-sensitizing the photo-resist layer by irradiating light to the substrate on which nanostructure materials are formed, developing the photosensed photo-resist layer, and forming a nanostructure on the substrate by etching the substrate using the developed photo-resist layer. The method provides a high efficiency of manufacturing process and easy forming a nanostructure on a large area of substrate since the method applies SPR to nanostructure materials formed in advance on a photo-resist layer.