发明名称 METHOD OF MANUFACTURING SUBSTRATE FOR SURFACE-ENHANCED RAMAN SPECTROGRAPHY
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate for surface-enhanced Raman spectrography.SOLUTION: A method of manufacturing a substrate (40) for SERS includes steps of: creating a support structure comprising microstructure patterns (5), each having a top portion (8) and sidewalls (7); depositing a multilayer (10) on the support structure, the multilayer (10) including at least two metal layers (13) and at least one intermediate layer (14) sandwiched therebetween, the intermediate layer (14) being made of a material that can be selectively etched with respect to the metal layers (13); etching portions of the multilayer (10) deposited on the top portions (8) of the microstructure patterns (5) to expose ends of each layer (13, 14) of the multilayer (10); and selectively etching the ends of the intermediate layers (14) to form cavities (20) between each pair of adjacent metal layers (13) at ends thereof.SELECTED DRAWING: Figure 5a
申请公布号 JP2016136138(A) 申请公布日期 2016.07.28
申请号 JP20160000709 申请日期 2016.01.05
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES 发明人 LANDIS STEFAN;VINCENT REBOUD
分类号 G01N21/65;B82Y20/00;B82Y40/00 主分类号 G01N21/65
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