| 摘要 |
PROBLEM TO BE SOLVED: To provide: an etchant composition which enables the etching of an indium oxide-based layer, and which can reduce the corrosion of titanium although it is an etchant composition containing hydrogen chloride; and an etching method with such an etching composition.SOLUTION: An etchant composition for an indium oxide-based layer according to the present invention consists of an aqueous solution comprising: (A) hydrogen chloride; and (B) at least one compound selected from a group consisting of diethylene triamine penta (methylenephosphonic acid) and a salt thereof, and ethylene diamine tetra(methylenephosphonic acid) and a salt thereof, provided that the concentration of (A) is 0.1-30 mass%, and that of (B) is 0.001-10 mass%.SELECTED DRAWING: Figure 1 |
