| 发明名称 |
POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS |
| 摘要 |
A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness. |
| 申请公布号 |
US2016370702(A1) |
申请公布日期 |
2016.12.22 |
| 申请号 |
US201615185195 |
申请日期 |
2016.06.17 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
Hatakeyama Jun;Hasegawa Koji;Sagehashi Masayoshi |
| 分类号 |
G03F7/039;C08F224/00;G03F7/32;G03F7/16;G03F7/20;C08F220/16;C08F222/20 |
主分类号 |
G03F7/039 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A polymer comprising recurring units (a1) having the general formula (1):wherein R1 is —C(═O)—R4, —O—C(═O)—R4 or —C(═O)—O—R4, R2 is hydrogen or methyl, R3 is an acid labile group, and R4 is a straight or branched C1-C4 alkyl group or C2-C4 alkenyl group, the polymer having a weight average molecular weight of 1,000 to 500,000. |
| 地址 |
Tokyo JP |
