| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal Bi-Bi oxide compound target having a sufficient high density, and capable of stably performing sputtering even if a metal Bi content is relatively small, and a manufacturing method of the metal Bi-Bi oxide compound target.SOLUTION: A sputtering target has a composition containing a metal Bi of 2-35 mol% and the rest of a Bi oxide and an inevitable impurity, a microstructure in which particles 12 of the metal Bi are scattered in a base material 11 of the Bi oxide, and a relative density of 80% or more to a theoretical density, the theoretical density being calculated from a density of the metal Bi, a density of the Bi oxide and the composition.SELECTED DRAWING: Figure 1 |
